1–7 von 7 Ergebnissen
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    Modeling the effects of excimer laser bandwidths on lithographic performance

    Kroyan, Armen / Bendik, Joseph J. / Semprez, Olivier et al. | SPIE | 2000

    Wavefront-based tool selection for critical level imaging

    Tyminski, Jacek K. / Lewellen, John | SPIE | 2004

    Technology qualification for 65-nm node

    Tyminski, Jacek K. / Nakashima, Toshiharu | SPIE | 2004

    High transmission mask technology for 45nm node imaging

    Conley, Will / Cangemi, Mike / Kasprowicz, Bryan S. et al. | SPIE | 2004

    Line-narrowed ArF excimer laser for 193-nm lithography

    Saito, Takashi / Mitsuhashi, Ken-ichi / Arai, Motohiro et al. | SPIE | 1999